GB/T 30858-2014
AbolishedPolished mono-crystalline sapphire substrate product
蓝宝石单晶衬底抛光片
Application Summary AI generated
GB/T 30858-2014 specifies the product classification, technical requirements, test methods, inspection rules, and packaging for polished mono-crystalline sapphire substrates. It is primarily applied in the manufacturing of LED epitaxial wafers, semiconductor devices, and optical components where high-quality, defect-free sapphire surfaces are critical. This standard ensures consistency in substrate dimensions, surface roughness, and crystalline orientation for downstream processing in the optoelectronics and microelectronics industries.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.