GB/T 20229-2006
AbolishedGallium phosphide single crystal
磷化镓单晶
Application Summary AI generated
GB/T 20229-2006 specifies the technical requirements, test methods, inspection rules, and packaging for gallium phosphide single crystal materials. It is applied in the semiconductor industry for the production of optoelectronic devices such as LEDs, photodetectors, and high-frequency electronic components. The standard ensures material quality and consistency for manufacturers and users in crystal growth, wafer processing, and device fabrication contexts.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
GB/T 11070-2006
Reduced germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.