GB/T 16595-1996
AbolishedSpecification for a universal wafer grid
晶片通用网格规范
Application Summary AI generated
This standard specifies the dimensions, tolerances, and layout of a universal grid pattern used for mapping and positioning semiconductor wafers during fabrication and testing. It is applied in the microelectronics industry to ensure consistent alignment and measurement across photolithography, inspection, and dicing processes for silicon wafers. The grid facilitates compatibility between different manufacturing equipment and quality control systems.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
GB/T 11070-2006
Reduced germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.