GB/T 29505-2013
ActiveTest method for measuring surface roughness on planar surfaces of silicon wafer
硅片平坦表面的表面粗糙度测量方法
Application Summary AI generated
This standard specifies the test method for measuring surface roughness on planar surfaces of silicon wafers, including the selection of measurement instruments, sampling conditions, and data evaluation procedures. It is applied in the semiconductor industry for quality control and process monitoring of polished or epitaxial silicon wafers used in integrated circuit fabrication. The standard ensures consistent roughness characterization critical for device performance and yield in microelectronics manufacturing.
Related Standards
GB/T 12964-2003
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GB/T 16596-1996
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GB/T 16595-1996
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Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
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Gallium arsenide single crystal
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Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.