GB/T 29504-2013
Active300mm monocrystalline silicon
300mm 硅单晶
Application Summary AI generated
GB/T 29504-2013 specifies the technical requirements, test methods, inspection rules, and packaging for 300mm diameter monocrystalline silicon wafers used in semiconductor manufacturing. It applies to the production and quality control of silicon substrates for integrated circuit fabrication, ensuring dimensional uniformity, crystal orientation, and electrical properties meet industry standards. This standard is critical for wafer suppliers and chip foundries to maintain compatibility in advanced lithography and device processing.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.