GB/T 1555-2009
AbolishedTesting methods for determining the orientation of a semiconductor single crystal
半导体单晶晶向测定方法
Application Summary AI generated
This standard specifies the test methods for determining the crystallographic orientation of semiconductor single crystals, such as silicon and germanium. It is applied in the manufacturing and quality control of semiconductor wafers and ingots, ensuring proper alignment for subsequent device fabrication processes like lithography and etching. The standard is used by material suppliers, wafer producers, and testing laboratories in the electronics and photovoltaic industries.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.