GB/T 1551-2009
AbolishedTest method for measuring resistivity of monocrystal silicon
硅单晶电阻率测定方法
Application Summary AI generated
This standard specifies the test methods for measuring the resistivity of monocrystal silicon, including the four-probe method and the eddy current method. It is applied in the semiconductor industry for quality control and material characterization of silicon wafers used in integrated circuits and photovoltaic devices. The standard ensures consistent measurement procedures for manufacturers and testing laboratories.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.