GB/T 14264-2009
AbolishedSemiconductor materials-terms and definitions
半导体材料术语
Application Summary AI generated
GB/T 14264-2009 defines standardized terminology for semiconductor materials, including terms related to crystal growth, doping, and material characterization. It is applied in the Chinese semiconductor industry for technical documentation, quality control, and communication among engineers, researchers, and manufacturers. The standard ensures consistent understanding of material properties and processes across design, production, and testing contexts.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.