GB/T 14141-2009

Active

Test method for sheet resistance of silicon epitaxial, diffused and ion-implanted layers using a collinear four-probe array

硅外延层、扩散层和离子注入层薄层电阻的测定直排四探针法

Standard Type

GBT

ICS

29.045

CCS

H80

Status

Active

Issue Date

2009-10-30

Implementation

2010-06-01

Centralized Committee

国家标准委

Issuing Authority

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

Application Summary AI generated

This standard specifies the test method for measuring the sheet resistance of silicon epitaxial, diffused, and ion-implanted layers using a collinear four-probe array. It is applied in the semiconductor industry for quality control and process monitoring of silicon wafers during the fabrication of integrated circuits and discrete devices. The method ensures accurate characterization of thin conductive layers in production and research environments.

Related Standards

GB/T 12964-2003 Monocrystalline silicon polished wafers GB/T 16596-1996 Specification for establishing a wafer coordinatesystem GB/T 16595-1996 Specification for a universal wafer grid GB/T 12965-2005 Monocrystalline silicon as cut slices and lapped slices GB/T 20230-2006 Indium phosphide single crystal GB/T 20229-2006 Gallium phosphide single crystal GB/T 20228-2006 Gallium arsenide single crystal GB/T 11071-2006 Zone-refined germanium ingot

Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.