GB/T 12964-2018
ActiveMonocrystalline silicon polished wafers
硅单晶抛光片
Application Summary AI generated
This standard specifies the technical requirements, test methods, inspection rules, and packaging for monocrystalline silicon polished wafers used in semiconductor device fabrication. It is applied in the manufacturing of integrated circuits and discrete devices, ensuring wafer quality for processes like photolithography and etching. The standard is critical for quality control in silicon wafer production and procurement within the electronics industry.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.