GB/Z 32490-2016
ActiveSurface chemical analysis—X-ray photoelectron spectroscopy—Procedures for determining backgrounds
表面化学分析 X射线光电子能谱 确定本底的程序
Application Summary AI generated
This standard specifies procedures for determining the background signal in X-ray photoelectron spectroscopy (XPS) measurements. It is applied in surface chemical analysis laboratories to ensure accurate quantification of elemental composition and chemical states by correcting for inelastic scattering and other background contributions. The standard is relevant for materials science, semiconductor manufacturing, and corrosion studies where precise surface characterization is critical.
Related Standards
GB/T 20724-2006
Method of thickness measurement for thin crystal by convergent beam electron diffraction
GB/T 28727-2012
Gas analysis - Determination of sulfides - Gas chromatograph with flame photometric detector
GB/T 14666-2003
Terms for analytical chemistry
GB/T 656-2003
Chemical reagent--Ammonium dichromate
GB/T 1265-2003
Chemical reagent--Sodium bromide
GB/T 674-2003
Chemical reagent--Copper(II)oxide powder
GB/T 606-2003
Chemical reagent--General method for the determination of water--Karl Fischer method
GB/T 19502-2004
Surface chemical analysis--Glowdischarge optical emission spectrometry(GD-OES)--Introduction to use
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.