GB/T 44221-2024
ActiveDetermination of wavefront aberration in optical systems—Electro-optical Shack-Hartmann method
光学系统波前像差的测定 夏克-哈特曼光电测量法
Application Summary AI generated
This standard specifies the electro-optical Shack-Hartmann method for measuring wavefront aberration in optical systems. It is applied in precision optics manufacturing, astronomical telescope alignment, and laser system testing to quantify optical quality and guide corrective adjustments. The method is particularly relevant for evaluating imaging performance in high-resolution cameras, lithography lenses, and adaptive optics systems.
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