GB/T 40110-2021
ActiveSurface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 全反射X射线荧光光谱法（TXRF）测定硅片表面元素污染
Application Summary AI generated
This standard specifies the use of total-reflection X-ray fluorescence (TXRF) spectroscopy to measure trace elemental contamination on the surface of silicon wafers. It is applied in the semiconductor manufacturing industry for quality control and process monitoring, specifically to detect and quantify metallic impurities on wafer surfaces that could affect device performance. The standard ensures consistent and reliable contamination analysis across different laboratories and production environments.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.