GB/T 36053-2018
ActiveEvaluation of thickness, density and interface width of thin films by X-ray reflectometry—Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
X射线反射法测量薄膜的厚度、密度和界面宽度 仪器要求、准直和定位、数据采集、数据分析和报告
Application Summary AI generated
This standard specifies the instrumental requirements, alignment procedures, data collection methods, and analysis protocols for using X-ray reflectometry to evaluate the thickness, density, and interface width of thin films. It is applied in materials science, semiconductor manufacturing, and optical coating industries where precise characterization of nanoscale film properties is critical for quality control and process development. The standard ensures consistent and reliable measurements across laboratories for thin films on substrates like silicon wafers or glass.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.