GB/T 34972-2017
ActiveDetermination of metal content in gases—Inductively coupled plasma mass spectrometry method
电子工业用气体中金属含量的测定 电感耦合等离子体质谱法
Application Summary AI generated
This standard specifies the use of inductively coupled plasma mass spectrometry (ICP-MS) to measure trace metal content in gases used in the electronics industry. It is applied to high-purity process gases such as nitrogen, argon, and hydrogen to ensure they meet stringent contamination limits for semiconductor manufacturing and other electronic component production. The method is critical for quality control in gas supply chains and cleanroom environments where metallic impurities can compromise device performance.
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