GB/T 34174-2017
ActiveSurface chemical analysis—Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation
表面化学分析 工作参考物质中离子注入产生的驻留面剂量定值的推荐程序
Application Summary AI generated
This standard specifies a recommended procedure for certifying the retained areic dose in a working reference material produced by ion implantation. It is applied in the field of surface chemical analysis, specifically for calibrating and validating instruments like secondary ion mass spectrometry (SIMS) or Auger electron spectroscopy (AES) used in semiconductor manufacturing, materials science, and quality control laboratories. The standard ensures traceable and consistent quantification of implanted ions in reference materials, supporting accurate depth profiling and compositional analysis of thin films and surfaces.
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