GB/T 30701-2014
ActiveSurface chemical analysis―Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 硅片工作标准样品表面元素的化学收集方法和全反射X射线荧光光谱法(TXRF)测定
Application Summary AI generated
This standard specifies a chemical method for collecting trace elements from the surface of silicon-wafer working reference materials and determining their concentration using total-reflection X-ray fluorescence (TXRF) spectroscopy. It is applied in the semiconductor industry for quality control and calibration of surface contamination analysis on silicon wafers, ensuring accurate measurement of elemental impurities at trace levels. The standard is used in manufacturing and testing environments where precise surface chemical characterization of silicon substrates is critical for device performance and reliability.
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