GB/T 29844-2013
ActiveSpecifications of metrology patterns for the evaluation of advanced photolithgraphy
用于先进集成电路光刻工艺综合评估的图形规范
Application Summary AI generated
This standard specifies the design and application of metrology patterns used to evaluate the performance and process control of advanced photolithography systems in semiconductor manufacturing. It is applied in the development and production of integrated circuits, particularly for critical dimension (CD) measurement, overlay registration, and focus/dose monitoring at sub-micron nodes. The standard ensures consistent and accurate characterization of lithographic tools and processes in wafer fabrication facilities.
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