GB/T 15870-1995
ActiveChrome thin films for hard surface photomasks
硬面光掩模用铬薄膜
Application Summary AI generated
This standard specifies the technical requirements, test methods, and inspection rules for chromium thin films used in hard-surface photomasks. It is applied in the semiconductor and microelectronics industries for manufacturing photomasks that require high durability and precision, particularly in photolithography processes for integrated circuits and other microdevices. The standard ensures the chromium films meet specifications for optical density, reflectivity, and defect density to maintain pattern accuracy during repeated use.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.