GB/T 15871-1995

This standard specifies the technical requirements, test methods, and inspection rules for hard surface photomask substrates used in semiconductor and microelectronics manufacturing. It applies to substrates made of materials like quartz or soda-lime glass, which are coated with a hard, durable layer (e.g., chromium) to form photomasks for photolithography processes. The standard ensures dimensional stability, surface quality, and defect control critical for producing integrated circuits and other microelectronic devices.