GB/T 29557-2013
ActiveSurface chemical analysis - Depth profiling - Measurment of sputtered depth
表面化学分析 深度剖析 溅射深度测量
Application Summary AI generated
This standard specifies methods for measuring the depth of material removed during sputter depth profiling in surface chemical analysis. It is applied in laboratories and industries using techniques like X-ray photoelectron spectroscopy (XPS) or secondary ion mass spectrometry (SIMS) to ensure accurate depth calibration for thin-film and multilayer material characterization. The standard is critical for quality control and research in semiconductor manufacturing, coatings, and materials science.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.