GB/T 25186-2010
ActiveSurface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
表面化学分析 二次离子质谱 - 由离子注入参考物质确定相对灵敏度因子
Application Summary AI generated
This standard specifies a method for determining relative sensitivity factors (RSFs) in secondary-ion mass spectrometry (SIMS) using ion-implanted reference materials. It is applied in surface chemical analysis to enable quantitative depth profiling of trace elements in solid materials, such as semiconductors, thin films, and coatings. The standard is used by analytical laboratories and quality control engineers to calibrate SIMS instruments for accurate compositional measurement in research and industrial production.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.