GB/T 22572-2008
ActiveSurface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
表面化学分析 二次离子质谱 用多δ层参考物质评估深度分辨参数的方法
Application Summary AI generated
This standard specifies a method for estimating depth resolution parameters in secondary-ion mass spectrometry (SIMS) using multiple delta-layer reference materials. It is applied in surface chemical analysis to evaluate and calibrate the depth profiling performance of SIMS instruments, particularly in semiconductor and thin-film industries where precise measurement of compositional changes over depth is critical. The method helps ensure accurate characterization of layered structures, such as doped silicon wafers or multilayer coatings.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.