GB/T 20175-2006
AbolishedSurface chemical analysis-Sputter depth profiling-Optimization using layered systems as reference materials
表面化学分析 溅射深度剖析 用层状膜系为参考物质的优化方法
Application Summary AI generated
This standard specifies the method for optimizing sputter depth profiling in surface chemical analysis by using layered systems as reference materials. It is applied in materials science and semiconductor industries to calibrate and improve the accuracy of depth profiling techniques, such as Auger electron spectroscopy or secondary ion mass spectrometry, when analyzing thin-film structures or coatings. The standard ensures reliable measurement of composition versus depth in layered samples.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.