GB/T 16880-1997
ActiveGuidelines for photomask defect classification and size definition
光掩模缺陷分类和尺寸定义的准则
Application Summary AI generated
This standard provides guidelines for classifying defects on photomasks and defining their sizes, specifically for the semiconductor and microelectronics industries. It is applied in the manufacturing and quality control of photomasks used in photolithography processes for integrated circuits and other microdevices. The standard ensures consistent defect evaluation criteria across production and inspection stages.
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