GB/T 16879-1997
ActiveGuidelines for precision and accuracy expression for mask writing equipment
掩模曝光系统精密度和准确度的表示准则
Application Summary AI generated
This standard provides guidelines for expressing the precision and accuracy of mask writing equipment used in semiconductor manufacturing. It is applied in the photomask production industry to define and communicate the performance specifications of pattern generators and laser/electron-beam writers. The standard ensures consistent terminology and measurement methods for evaluating equipment capability in producing integrated circuit masks.
Related Standards
GB/T 18502-2001
The DC critical current measurement for Ag or Ag-alloy sheathed bismuthal oxide superconductor
GB/T 17564.4-2001
Standard data element types with associated classification scheme for electric components--Part 4:IEC reference collection of standard data element types，component classes and terms
GB/T 17564.2-2000
Standard data element types with associated classification scheme for electric components--Part 2:EXPRESS dictionary schema
GB/T 17564.3-1999
Standard data element types with associated classification scheme for electric components--Part 3:Maintenance and validation procedures
GB/T 16880-1997
Guidelines for photomask defect classification and size definition
GB/T 16822-1997
Test method for dielectric properties of dielectric crystal
GB/T 16517-1996
Quartz crystal units--A specification in the quality assessment system for electronic components--Part 3:Sectional specification--Qualification approval
GB/T 16513-1996
Fixed inductors for radio interference suppression--Part 2:Sectional specification--Selection of methods of test and general requirements
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.