GB/T 31227-2014
ActiveTest method for the surface roughness by atomic force microscope for sputtered thin films
原子力显微镜测量溅射薄膜表面粗糙度的方法
Application Summary AI generated
This standard specifies the test method for measuring the surface roughness of sputtered thin films using an atomic force microscope (AFM). It is applied in the fields of materials science and microelectronics manufacturing, particularly for quality control and characterization of thin film coatings on substrates like semiconductors, optical components, and magnetic storage devices. The method provides a quantitative assessment of nanoscale surface topography to ensure film performance in applications such as integrated circuits, solar cells, and hard disk drives.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.