GB/T 5252-2006
AbolishedGermanium monocrystal - inspection of dislocation etch pit density
锗单晶位错腐蚀坑密度测量方法
Application Summary AI generated
This standard specifies the method for measuring dislocation etch pit density in germanium monocrystals, providing a quantitative assessment of crystal lattice defects. It is applied in the metallurgy and semiconductor industries for quality control during the production and processing of germanium wafers used in infrared optics, solar cells, and high-frequency electronics. The testing context involves chemical etching of polished crystal surfaces followed by microscopic counting of etch pits to ensure material purity and structural integrity.
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