GB/T 45826-2025
ActiveTitania doped silica glass for lithography
光刻用掺钛石英玻璃
Application Summary AI generated
GB/T 45826-2025 specifies the technical requirements, test methods, inspection rules, and packaging for titania doped silica glass used in semiconductor lithography equipment. This standard applies to the manufacturing of high-purity optical components, such as projection lens elements and photomask substrates, which require ultra-low thermal expansion and high UV transparency for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes. It ensures material consistency and performance for critical applications in integrated circuit fabrication and advanced photomask production.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.