GB/T 4324.20-2012
ActiveMethods for chemical analysis of tungsten - Part 20: Determination of vanadium content - Inductively coupled plasma atomic emission spectrometry
钨化学分析方法 第20部分：钒量的测定 电感耦合等离子体原子发射光谱法
Application Summary AI generated
This standard specifies the inductively coupled plasma atomic emission spectrometry (ICP-AES) method for determining vanadium content in tungsten materials. It is applied in the metallurgical industry for quality control and chemical analysis of tungsten ores, concentrates, and tungsten products. The method ensures accurate measurement of trace vanadium levels, which is critical for assessing material purity and performance in high-temperature or electronic applications.
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