GB/T 42106-2022
ActiveNanotechnology—Fabrication of three dimensional nanostructures and devices—A strain method induced by ion beam irradiation
纳米技术 三维纳米结构与器件的加工方法 离子束辐照诱导应变法
Application Summary AI generated
This standard specifies the strain method induced by ion beam irradiation for fabricating three-dimensional nanostructures and devices. It is applied in nanotechnology research and development, particularly for creating curved or folded nanoscale components used in microelectromechanical systems (MEMS), sensors, and advanced electronic devices. The method is relevant in laboratory and industrial settings where precise, controllable deformation of nanostructures is required.
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