GB/T 34900-2017
ActiveMicro-electromechanical system technology—Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer
微机电系统（MEMS）技术 基于光学干涉的MEMS微结构残余应变测量方法
Application Summary AI generated
This standard specifies a method for measuring residual strain in MEMS microstructures using optical interferometry. It is applied in the design, fabrication, and quality control of micro-electromechanical systems, such as accelerometers, gyroscopes, and micro-mirrors, where residual strain affects device performance and reliability. The method is used in research labs and manufacturing environments to characterize thin films and released structures in semiconductor and MEMS foundries.
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