GB/T 34894-2017

Active

Micro-electromechanical system technology—Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer

微机电系统(MEMS)技术 基于光学干涉的MEMS微结构应变梯度测量方法

Standard Type
GBT
ICS
31.200
CCS
L55
Status
Active
Issue Date
2017-11-01
Implementation
2018-05-01
Centralized Committee
国家标准委
Issuing Authority
中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

Application Summary AI generated

This standard specifies a method for measuring the strain gradient in MEMS microstructures using an optical interferometer. It is applied in the design, manufacturing, and quality control of micro-electromechanical systems to evaluate residual stress and deformation in thin-film layers and released structures. The method is critical for ensuring the reliability and performance of MEMS devices such as accelerometers, gyroscopes, and micro-mirrors in consumer electronics, automotive, and aerospace industries.

Related Standards

Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.