GB/T 34178-2017
ActiveSilica glass substrates for photomask
光掩模石英玻璃基板
Application Summary AI generated
GB/T 34178-2017 specifies the technical requirements, test methods, inspection rules, and packaging for silica glass substrates used in photomasks. It is applied in the semiconductor and microelectronics industries for manufacturing photomasks, which are essential for photolithography processes in integrated circuit and flat panel display production. The standard ensures dimensional accuracy, surface quality, and optical uniformity of substrates used in high-precision patterning.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.