GB/T 34177-2017
ActiveQuartz glass wafer for lithography
光刻用石英玻璃晶圆
Application Summary AI generated
GB/T 34177-2017 specifies the technical requirements, test methods, inspection rules, and packaging for quartz glass wafers used in lithography processes. It applies to the manufacturing of photomasks and optical components in semiconductor fabrication, where high-purity, low-defect quartz wafers are critical for precise UV light transmission and pattern transfer. The standard ensures dimensional accuracy, surface quality, and thermal stability for use in photolithography equipment within the microelectronics industry.
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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.