GB/T 32814-2016
ActiveSilicon-based MEMS fabrication technology—Specification for criterion of the SOI wafer based MEMS process
硅基MEMS制造技术 基于SOI硅片的MEMS工艺规范
Application Summary AI generated
This standard specifies the process requirements, quality control, and testing methods for fabricating Micro-Electro-Mechanical Systems (MEMS) devices using Silicon-on-Insulator (SOI) wafers. It is applied in the semiconductor and microelectronics industries, particularly for manufacturing MEMS sensors, actuators, and resonators where precise structural layer thickness and electrical isolation are critical. The standard ensures consistency and reliability in processes like deep reactive-ion etching (DRIE) and wafer bonding for high-volume production.
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