GB/T 30860-2014

Active

Test methods for surface roughness and saw mark of silicon wafers for solar cells

太阳能电池用硅片表面粗糙度及切割线痕测试方法

Standard Type
GBT
ICS
77.040
CCS
H21
Status
Active
Issue Date
2014-07-24
Implementation
2015-04-01
Centralized Committee
国家标准委
Issuing Authority
中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

Application Summary AI generated

This standard specifies the test methods for measuring surface roughness and saw marks on silicon wafers used in solar cell manufacturing. It is applied in the photovoltaic industry to evaluate wafer quality after slicing, ensuring consistent surface characteristics for subsequent cell processing. The methods are used by wafer producers and quality control labs to verify compliance with production specifications.

Related Standards

Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.