GB/T 29658-2013
ActiveHigh-Purity sputtering aluminium and aluminium alloy target used in electronic film
电子薄膜用高纯铝及铝合金溅射靶材
Application Summary AI generated
This standard specifies the technical requirements, test methods, inspection rules, and packaging for high-purity aluminium and aluminium alloy sputtering targets used in electronic thin-film applications. It is primarily applied in the semiconductor and flat-panel display industries, where these targets are used in physical vapor deposition (PVD) processes to create conductive or barrier layers on substrates like silicon wafers or glass panels. The standard ensures consistent purity, microstructure, and dimensional accuracy critical for reliable film deposition in integrated circuits and display manufacturing.
Related Standards
GB/T 5153-2003
Designation and composition of wrought magnesium and magnesium alloys
GB/T 12690.10-2003
Chemical analysis methods for non-rare earth impurities of rare earth metals and their oxides--Determination of phosphorus content by molybdenum blue spectrophotometric method
GB/T 12690.11-2003
Chemical analysis methods for non-rare earth impurities of rare earth metals and their oxides--Determination of magnesium content--Flame atomic absorptionspectrometric method
GB/T 12690.13-2003
Chemical analysis methods for non-rareearth impurities of rare earth metals and their oxides--Determination of molybdenum and tungsten content--Induct-ively coupled plasma atomic emission spectrographic method and inductively coupled plasma mass spectrum
GB/T 12690.12-2003
Chemical analysis methods for non-rare earth impurities of rare earth metals and their oxides--Determination of thorium content--Arsenazo III spectrophotometric method and inductively coupled plasma mass spectrum method
GB/T 12690.4-2003
Chemical analysis methods for non-rare earth impurities ofrare earth metals and their oxides--Determination of oxygen and nitrogen content--Impulse-infrared and impulse-thermal conductance absorption method
GB/T 12690.5-2003
Chemical analysis methods for non-rare earth impurities of rare earth metals and their oxides--Determination of Al、Cr、Mn、Fe、Co、Ni、Cu、Zn、Pb content by inductively coupled plasma atomic emission spectrographic method--Determination of Co、Mn、Pb、N
GB/T 12690.6-2003
Chemical analysis methods for non-rare earth impurities of rare earth metals and their oxides--Determination of iron content--Kalium thiocyanate，1，10-phenanthroline spectrophotometric method
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.