GB/T 28274-2012

Active

Silicon-based MEMS fabrication technology - The basic regulation of layout design

硅基MEMS制造技术 版图设计基本规则

Standard Type
GBT
ICS
31.200
CCS
L55
Status
Active
Issue Date
2012-05-11
Implementation
2012-12-01
Centralized Committee
国家标准委
Issuing Authority
中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

Application Summary AI generated

This standard specifies the fundamental rules for layout design in silicon-based MEMS (Micro-Electro-Mechanical Systems) fabrication. It is applied in the design and manufacturing of microsensors, microactuators, and other MEMS devices to ensure compatibility with photolithography, etching, and thin-film deposition processes. The regulation helps engineers avoid design-rule violations that could cause fabrication failures or performance degradation in integrated MEMS products.

Related Standards

Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.