GB/T 25934.2-2010
ActiveMethods for chemical analysis of high purity gold - Part 2: Inductively coupled plasma mass spectrometry standard enter emendation-inner standard method - Determination of impurity elements contents
高纯金化学分析方法 第2部分：ICP-MS-标准加入校正-内标法 测定杂质元素的含量
Application Summary AI generated
This standard specifies a method for determining trace impurity elements in high-purity gold using inductively coupled plasma mass spectrometry (ICP-MS) with standard addition and internal standard correction. It is applied in the metallurgical industry for quality control and certification of high-purity gold (typically 99.999% or higher) used in electronics, aerospace, and precision instrumentation. The method ensures accurate quantification of contaminants at extremely low concentrations, critical for verifying material purity in manufacturing and research contexts.
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