GB/T 23364.4-2009
ActiveMethods for chemical analysis of high purity indium oxide - Part 4: Determination of aluminum, iron, copper, zinc, cadmium, lead and thallium content - Inductively coupled plasma mass spectrometry
高纯氧化铟化学分析方法 第4部分：铝、铁、铜、锌、镉、铅和铊量的测定 电感耦合等离子体质谱法
Application Summary AI generated
This standard specifies the inductively coupled plasma mass spectrometry (ICP-MS) method for determining trace levels of aluminum, iron, copper, zinc, cadmium, lead, and thallium in high-purity indium oxide. It is applied in the metallurgy and semiconductor industries for quality control and purity verification of indium oxide used in transparent conductive films, optoelectronic devices, and liquid crystal displays. The method ensures accurate detection of metallic impurities at parts-per-billion levels, critical for maintaining material performance in high-tech applications.
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