GB/T 23362.4-2009
ActiveMethods for chemical analysis of high purity indium hydroxide - Part 4: Determination of aluminum, iron, copper, zinc, cadmium, lead and thallium content - Inductively coupled plasma mass spectrometry
高纯氢氧化铟化学分析方法 第4部分：铝、铁、铜、锌、镉、铅和铊量的测定 电感耦合等离子体质谱法
Application Summary AI generated
This standard specifies the inductively coupled plasma mass spectrometry (ICP-MS) method for determining trace levels of aluminum, iron, copper, zinc, cadmium, lead, and thallium in high purity indium hydroxide. It is applied in the metallurgy and semiconductor industries for quality control and purity verification of indium hydroxide used in electronic materials, optoelectronics, and thin-film manufacturing. The method ensures that impurity concentrations meet stringent requirements for high-purity applications, particularly in advanced electronic and optical device production.
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