GB/T 19922-2005

Active

Standard test methods for measuring site flatness on silicon wafers by noncontact scanning

硅片局部平整度非接触式标准测试方法

Standard Type
GBT
ICS
77.040.01
CCS
H17
Status
Active
Issue Date
2005-09-19
Implementation
2006-04-01
Centralized Committee
工业和信息化部（电子）
Issuing Authority
中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

Application Summary AI generated

This standard specifies non-contact scanning methods for measuring local flatness variations on silicon wafer surfaces, focusing on parameters like site flatness (SFQR) and site front surface least squares range (SFQD). It is applied in the semiconductor industry for quality control and process monitoring of polished silicon wafers used in integrated circuit fabrication, ensuring that wafer surface topography meets stringent requirements for photolithography and device yield.

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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.