GB/T 17866-1999
ActiveGuideline for programmed defect masks and benchmark procedures for sensitivity analysisof mask defect inspection systems
掩模缺陷检查系统灵敏度分析所用的特制缺陷掩模和评估测量方法准则
Application Summary AI generated
This standard provides guidelines for creating programmed defect masks and establishing benchmark procedures to evaluate the sensitivity of mask defect inspection systems. It is specifically applied in the semiconductor industry for photomask manufacturing, where it ensures consistent and accurate detection of defects during the inspection process. The standard is used by engineers and quality control teams to validate and compare the performance of different inspection tools.
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