GB/T 17866-1999

Active

Guideline for programmed defect masks and benchmark procedures for sensitivity analysisof mask defect inspection systems

掩模缺陷检查系统灵敏度分析所用的特制缺陷掩模和评估测量方法准则

Standard Type
GBT
ICS
31.200
CCS
L56
Status
Active
Issue Date
1999-09-13
Implementation
2000-06-01
Centralized Committee
国家标准委
Issuing Authority
国家质量技术监督局

Application Summary AI generated

This standard provides guidelines for creating programmed defect masks and establishing benchmark procedures to evaluate the sensitivity of mask defect inspection systems. It is specifically applied in the semiconductor industry for photomask manufacturing, where it ensures consistent and accurate detection of defects during the inspection process. The standard is used by engineers and quality control teams to validate and compare the performance of different inspection tools.

Related Standards

Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.