GB/T 16878-1997

Active

Specification for metrology pattern cells for integrated circuit manufacture

用于集成电路制造技术的检测图形单元规范

Standard Type
GBT
ICS
31.200
CCS
L97
Status
Active
Issue Date
1997-06-20
Implementation
1998-03-01
Centralized Committee
国家标准委
Issuing Authority
国家技术监督局

Application Summary AI generated

This standard specifies the design and layout requirements for metrology pattern cells used in integrated circuit manufacturing. It is applied in semiconductor fabrication facilities to ensure consistent and accurate measurement of critical dimensions, overlay alignment, and film thickness during photolithography and etching processes. The standard supports quality control and process monitoring in the production of microchips and other microelectronic devices.

Related Standards

Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.