GB/T 16527-1996

Active

Specification for photoresist/E-beam resist for hard surface photoplates

硬面感光板中光致抗蚀剂和电子束抗蚀剂规范

Standard Type
GBT
ICS
31.200
CCS
L90
Status
Active
Issue Date
1996-09-09
Implementation
1997-05-01
Centralized Committee
国家标准委
Issuing Authority
国家标准委

Application Summary AI generated

This standard specifies the technical requirements, test methods, and quality acceptance criteria for photoresist and electron-beam resist materials used in the production of hard surface photoplates. It is applied in the semiconductor and microelectronics industries, specifically for manufacturing photomasks and reticles where precise pattern transfer onto hard substrates like chromium-coated quartz is required. The standard ensures consistent resist performance in photolithography and electron-beam lithography processes for integrated circuit fabrication.

Related Standards

Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.