GB/T 16524-1996

Active

Specification for registration marks for photomasks

光掩模对准标记规范

Standard Type
GBT
ICS
31.200
CCS
L95
Status
Active
Issue Date
1996-09-09
Implementation
1997-05-01
Centralized Committee
国家标准委
Issuing Authority
国家技术监督局

Application Summary AI generated

This standard specifies the design, dimensions, and placement of registration marks used on photomasks for integrated circuit and microelectronic device fabrication. It is applied in semiconductor manufacturing to ensure precise alignment between multiple photomask layers during photolithography processes. The specification is critical for maintaining overlay accuracy in wafer steppers and scanners.

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Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.