GB/T 16523-1996
ActiveSpecification for round quartz photomask substrates
圆形石英玻璃光掩模基板规范
Application Summary AI generated
This standard specifies the dimensional, optical, and surface quality requirements for round quartz glass substrates used in photomask fabrication. It is applied in the semiconductor and microelectronics industries for manufacturing photomasks used in photolithography processes, particularly for integrated circuit and flat panel display production. The standard ensures substrate consistency and compatibility with mask-making equipment and processes.
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