GB/T 11073-2007
AbolishedStandard method for measuring radial resistivity variation on silicon slices
硅片径向电阻率变化的测量方法
Application Summary AI generated
This standard specifies a test method for measuring the variation in resistivity along the radius of silicon slices, which is critical for assessing the uniformity of semiconductor-grade silicon wafers. It is applied in the metallurgy and electronics industries, specifically during the quality control of silicon substrates used in integrated circuit and solar cell manufacturing. The method ensures consistent electrical properties across the wafer surface, which directly impacts device performance and yield.
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